Research opportunities are available to develop and advance measurement methods using vacuum ultraviolet (VUV) radiation sources for performing mass spectroscopy at high field. NIST Boulder will build a new metrology instrument for spatially-resolved single-atom time-of-flight mass spectroscopy of a biased sample (10 V/nm) using VUV (8.4 eV) photons. We are soliciting proposals to design, assemble, and operate a VUV apparatus for mass spectroscopy. This apparatus will be primarily used to study complex laser-matter interactions on a variety of technologically relevant systems for the semiconductor industry. Beyond semiconductors and microelectronics, the VUV source and beamline may be used for metrology applications in other critical emerging technologies such as advanced engineering materials.

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